SKU: SOD-WMU-076-2-C-P Category: Tags: ,

The USAF 1951 resolution target was created due to the need to assign numerical tolerances to optical systems and photographic processes. The resolution range depends on the quality and functioni of the system or process being tested. In the standard Air Force 1951 target, the change in pattern size is in a geometric progression based on the sixth root of 2. To simplify, the number of lines per millimeter doubles with every sixth target element. These six elements are known as a group, and the group heading, such as -2, is the power of 2 to which the first element is raised to express the number of lines per millimeter in that element. In other words, 2 to the -2 power (2^-2) is 0.25 line per millimeter, 2 to the 0 power (2^0) is one line per millimeter, and so forth.

Available on backorder


Customized Target based on Chrome on soda lime glass (float glass)

  • Minimum: Group -2, Element 1; Maximum: Group 5, Element 5, Positive type

Manufacturing Process

  • Direct write lithography technology to make chrome pattern on chrome mask layer above soda lime glass (float glass) substrate to ensure within +/-1um overall accuracy.
  • Minimum feature size: Down to 0.75 μm
  • Address grid: Down to 12.5 nm
  • Exchangeable write modes
  • Real-time autofocus system
  • High power DPSS laser with 355 nm wavelength
  • Camera system for metrology and alignment
  • Closed-loop climate chamber
  • Edge detector system



Additional information


Brand Series